Innovative Plasma Monitoring Tool Curling Probe
Electron Density & Optical Emission at the same time and locationfrom Atmospheric Plasma and Pulse Plasma |
●Measurable even when film is deposited ●From low to atmospheric pressure ●Wide plasma density range (108~1013cm-3) ●Optical emission analysis (same time) ●Available for pulse plasma ●Usable for monitoring of film thickness (thickness? 0.1μm) ●Easy operation, low cost |
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