■ Measurable Environment of Plasma |
-Discharge gas: any gases used in plasma etching, cleaning, deposition, surface modification -Pressure: no limit for low pressure, a high pressure limit ~ atmospheric pressure -Discharge mode: dc glow, capacitive rf discharge, inductive rf discharge, microwave discharge, pulsed discharge, magnetron discharge (available in a region far from cathode) -Environmental temperature: <550 ℃ |
■ General Specifications of Curing Probe Measurement |
-Electron Density Measurement Measurable density: 108- 1013・cm-3 Space-resolved measurement: available over a range of 800 mm Time-resolved measurement: available with use of on-point method of network analyzer -Monitoring of thin film deposited on curling probe surface Measurable thickness: > 20 nm (depending on network analyzer) -Optical emission from plasma Measurable with use of opto-curling probe(The probe outer diameter is limited to 16mm) |
Ordering Information -Curling Probe (main body) Probe diameterD: 10 mm, 16 mm Probe lengthL: 400 mm, 800 mm Temperature T: 200℃, 550℃ Model Number: NL-CP〇〇〇-〇〇□□□ For example, model NL-CP150-16BAV |
|
Option 1: Coat of probe head and insertion pipe by yttria (Y2O3) for suppression of metal impurity release from probe Option 2: Antenna made of Cu-W alloy for high-resolution frequency measurement Option 3: Opto-curling probe for optical emission analysis |
■ Network Analyzer and Power Limiter |
Vector network analyzer MS46121A (40 MHz~4 GHz) with calibration kit |
|
